21-Mat-B10 Properties and Processing of Micro- and Nanomaterials · December 2018
Nivaar worked solution (AI-drafted; not reviewed by a licensed engineer)
National Exams — 12-Mtl-B10, Advanced Electronic Materials — December 2018, 3 hours. Six questions; Question 6 (40 marks) is mandatory and any 4 of the remaining 5 questions (15 marks each) complete the paper. All six are answered below.
Reference texts: S.O. Kasap, Principles of Electronic Materials and Devices; W.D. Callister, Materials Science and Engineering: An Introduction.
Question text not reproduced: the examination questions are © Engineers and Geoscientists BC. Open the official past paper (linked at the top of this page) to read the question, then follow the worked solution below.
Approach. At 0 K, all three classes have completely filled lower bands; the classification hinges entirely on whether the highest filled band overlaps the next empty band (metal) or is separated from it by a gap, and if so, how wide that gap is relative to what an applied field or modest thermal energy can bridge.
In a metal the highest band is either partially filled or overlaps the next band, so electrons immediately above EF can move into empty states under an arbitrarily small applied field — there is no gap to overcome. Approximate gap: Eg ≈ 0 eV.
At 0 K a semiconductor conducts no better than an insulator (the valence band is full, the conduction band is empty), but its gap is narrow enough that modest thermal energy or dopant levels populate the conduction band at working temperatures. Approximate gaps: Si ≈ 1.1 eV, Ge ≈ 0.7 eV, GaAs ≈ 1.4 eV.
An insulator has the identical filled-valence/empty-conduction-band picture as a semiconductor, differing only in the size of Eg: it is wide enough that essentially no electrons are thermally promoted across it at any accessible temperature, so the material stays non-conducting. Approximate gaps: diamond ≈ 5.5 eV, SiO2 ≈ 9 eV, Al2O3 ≈ 8–9 eV.
| Material class | Band picture at 0 K | Approximate Eg |
|---|---|---|
| Metal | Overlapping / partially filled bands | ≈ 0 eV |
| Semiconductor (Si) | Filled VB, empty CB, narrow gap | ≈ 1.1 eV |
| Insulator (SiO2) | Filled VB, empty CB, wide gap | ≈ 9 eV |