Nivaar worked solution (AI-drafted; not reviewed by a licensed engineer)
Notes on this paper
98-Phys-A5 — Semiconductor Devices & Circuits — National Exams, May 2015
3 hours duration. Closed book exam (useful constants, equations and device models are annexed to the exam paper). Any FIVE (5) of the SEVEN (7) questions constitute a complete exam paper; all seven are answered here as a complete study resource.
Reference texts: A. S. Sedra & K. C. Smith, Microelectronic Circuits, 8th ed. (semiconductor/diode physics Ch. 3–4, op-amp and active-filter circuits Ch. 2 & 12, MOSFET small-signal amplifiers Ch. 7, data converters Ch. 17, waveform-shaping/signal generators Ch. 13); M. M. Mano & M. D. Ciletti, Digital Design, 6th ed. (CMOS/NMOS logic-family gates Ch. 10); C. Kittel, Introduction to Solid State Physics, 8th ed. (semiconductor carrier transport and statistics Ch. 8).
Given. An abrupt silicon $n^+p$ junction diode with the doping, minority-carrier lifetime and mobility data in Table T2 at 300 K.
Symbol
p-type region
n-type region
Doping
$N_a=5\times10^{15}\,\text{cm}^{-3}$
$N_d=10^{18}\,\text{cm}^{-3}$ ($n^+$)
Minority-carrier lifetime
$\tau_n=0.1\,\mu\text{s}$ (electrons)
$\tau_p=10\,\mu\text{s}$ (holes)
Majority mobility
$\mu_p=200\,\text{cm}^2/\text{V-s}$
$\mu_n=1300\,\text{cm}^2/\text{V-s}$
Minority mobility
$\mu_n=700\,\text{cm}^2/\text{V-s}$
$\mu_p=450\,\text{cm}^2/\text{V-s}$
$A=10^{-4}\,\text{cm}^2$, $T=300^\circ\text{K}$, $n_i=p_i=2\times10^{10}\,\text{cm}^{-3}$ (as stated in this question), $V_T=kT/q=26\,\text{mV}$.
Find. (a) $\phi_p=E_i-E_F$ (p-side) and $\phi_n=E_F-E_i$ (n-side); (b) contact potential $V_o$; (c) saturation current $I_S$; (d) field in the p-region far from the junction at $I=4\,\text{mA}$.
Approach. (a) mass-action law gives the Fermi-level offset from $E_i$ on each side. (b) $V_o=\phi_p+\phi_n$ is exactly the total band-bending drawn on the equilibrium diagram. (c) the ideal-diode saturation current sums minority-carrier diffusion into both sides; because $N_a\ll N_d$ (this is an $n^+p$ junction), electron injection into the lightly-doped p-side dominates. (d) far from the junction only majority-carrier drift is present, so $\varepsilon=J/\sigma$ with the majority mobility.
Part (a) — Fermi-level offsets. Using $E_i-E_F=V_T\ln(N_a/n_i)$ on the p-side and $E_F-E_i=V_T\ln(N_d/n_i)$ on the n-side:
$$\phi_p=0.026\ln\!\left(\frac{5\times10^{15}}{2\times10^{10}}\right)=\boxed{0.323\ \text{eV}}\qquad
\phi_n=0.026\ln\!\left(\frac{10^{18}}{2\times10^{10}}\right)=\boxed{0.461\ \text{eV}}$$
($E_F$ sits 0.323 eV below $E_i$ in the p-region and 0.461 eV above $E_i$ in the n-region.)
Part (b) — band diagram and contact potential. At equilibrium the Fermi level $E_F$ is flat (constant) across the whole structure. Far from the junction on each side, $E_i$ sits at its own flat bulk position relative to $E_F$: 0.323 eV above $E_F$ in the p-region, 0.461 eV below $E_F$ in the n-region. Between those two flat regions, $E_i$ (and every band edge with it) bends smoothly through the depletion layer; reading the total vertical drop in $E_i$ from the n-side bulk to the p-side bulk on the diagram gives exactly the built-in potential:
$$V_o=\phi_p+\phi_n=V_T\ln\!\left(\frac{N_aN_d}{n_i^2}\right)=0.323+0.461=\boxed{0.784\ \text{V}}$$
Part (c) — saturation current $I_S$. Both sides contribute minority-carrier diffusion current. On the p-side the minority carriers are electrons ($D_n=\mu_{n,p\text{-side}}V_T=700(0.026)=18.2\,\text{cm}^2/\text{s}$, $L_n=\sqrt{D_n\tau_n}=\sqrt{18.2\times0.1\times10^{-6}}=1.349\times10^{-3}\,\text{cm}$, $n_{p0}=n_i^2/N_a=8\times10^4\,\text{cm}^{-3}$). On the n-side the minority carriers are holes ($D_p=\mu_{p,n\text{-side}}V_T=450(0.026)=11.7\,\text{cm}^2/\text{s}$, $L_p=\sqrt{D_p\tau_p}=\sqrt{11.7\times10\times10^{-6}}=1.082\times10^{-2}\,\text{cm}$, $p_{n0}=n_i^2/N_d=400\,\text{cm}^{-3}$). Summing both terms:
$$I_S=qA\left(\frac{D_nn_{p0}}{L_n}+\frac{D_pp_{n0}}{L_p}\right)=qA\left(1.079\times10^9+4.33\times10^5\right)\ \text{cm}^{-2}\text{s}^{-1}$$
$$I_S=(1.6\times10^{-19})(10^{-4})(1.080\times10^9)=\boxed{1.73\times10^{-14}\ \text{A}\ (17.3\ \text{fA})}$$
Electron injection into the p-side outweighs hole injection into the n-side by roughly $2500:1$ — expected, since this is an $n^+p$ diode ($N_d\gg N_a$).
Part (d) — field in the p-region far from the junction. Far from the junction the minority-carrier density has relaxed back to its tiny equilibrium value, so essentially all of the current is carried by majority-carrier (hole) drift, using the p-region's majority mobility $\mu_p=200\,\text{cm}^2/\text{V-s}$:
$$\sigma_p=qN_a\mu_p=(1.6\times10^{-19})(5\times10^{15})(200)=0.160\ \text{S/cm}$$
$$\varepsilon_p=\frac{J}{\sigma_p}=\frac{I/A}{\sigma_p}=\frac{4\times10^{-3}/10^{-4}}{0.160}=\boxed{250\ \text{V/cm}}$$